The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Sep. 22, 2017
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Isao Hirano, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Shoichi Terada, Kumamoto, JP;
Junji Nakamura, Kumamoto, JP;
Takayuki Toshima, Kumamoto, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.