Company Filing History:

9 out of 10,295

Tokyo Electron Limited

patents

2 out of 1,233

Tokyo Ohka Kogyo Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2013-2022

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9 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11441101 - Cleaning composition, cleaning method, and method for manufacturing semiconductor (2022-09-13),

2. 11355362 - Washing method, washing device, storage medium, and washing composition (2022-06-07),

3. 10591823 - Substrate processing apparatus and substrate processing method (2020-03-17),

4. 10347482 - Substrate processing apparatus, substrate processing method, and storage medium with program stored therein for executing substrate processing method (2019-07-09),

5. 9744551 - Coating apparatus and nozzle (2017-08-29),

6. 8888920 - Imprint system, imprint method, and non-transitory computer storage medium (2014-11-18),

7. 8840728 - Imprint system for performing a treatment on a template (2014-09-23),

8. 8522712 - Template treatment method, program, computer storage medium, template treatment apparatus and imprint system (2013-09-03),

9. 8468943 - Imprint method, computer storage medium and imprint apparatus (2013-06-25),

Title: The Innovative Contributions of Shoichi Terada

Introduction

Shoichi Terada is a prominent inventor based in Koshi, Japan, known for his significant contributions to the field of semiconductor manufacturing. With a total of nine patents to his name, Terada has developed innovative solutions that enhance the efficiency and effectiveness of cleaning processes in semiconductor production.

Latest Patents

Among his latest patents, Terada has introduced a cleaning composition and method specifically designed for semiconductor manufacturing. This cleaning composition effectively removes a layer of interest while preventing damage to other layers, such as substrates and interlayer insulation films. The method utilizes a cleaning composition that contains components capable of decomposing the layer of interest, which can include hard mask films. Additionally, Terada has developed a washing method and device that enable the effective removal of layers by decomposing them at higher temperatures than conventional methods. This innovative approach involves supplying vapor of a decomposing component, such as nitric acid or a fluorinated alkyl sulfonic acid, to a heated substrate.

Career Highlights

Throughout his career, Shoichi Terada has worked with notable companies in the semiconductor industry, including Tokyo Electron Limited and Tokyo Ohka Kogyo Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to advancements in semiconductor technology.

Collaborations

Terada has collaborated with esteemed colleagues, including Takahiro Kitano and Junji Nakamura, to further enhance his research and development efforts in the field.

Conclusion

Shoichi Terada's innovative patents and contributions to semiconductor manufacturing demonstrate his commitment to advancing technology in this critical industry. His work continues to influence the efficiency of cleaning processes, ensuring the integrity of semiconductor production.

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