The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Jun. 18, 2013
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takayuki Ishii, Kumamoto, JP;

Takahiro Sakamoto, Kumamoto, JP;

Takahiro Kitano, Kumamoto, JP;

Shoichi Terada, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B 1/04 (2006.01); B05C 5/02 (2006.01); B05B 12/08 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B05C 5/0258 (2013.01); B05B 1/044 (2013.01); B05B 12/081 (2013.01); B05C 5/0254 (2013.01); H01L 21/6715 (2013.01);
Abstract

Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.


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