The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Feb. 02, 2018
Applicants:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Isao Hirano, Kawasaki, JP;

Shoichi Terada, Tokyo, JP;

Junji Nakamura, Tokyo, JP;

Takayuki Toshima, Tokyo, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/304 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01); C11D 7/08 (2006.01); C11D 7/34 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67028 (2013.01); C11D 7/08 (2013.01); C11D 7/34 (2013.01); G03F 7/42 (2013.01); H01L 21/027 (2013.01); H01L 21/02052 (2013.01); H01L 21/304 (2013.01); H01L 21/308 (2013.01); H01L 21/3065 (2013.01); H01L 21/324 (2013.01); H01L 21/67098 (2013.01); H01L 21/67248 (2013.01);
Abstract

A washing method, a washing device, a storage medium, and a washing composition for enabling effective removal of a layer to be processed by decomposing or degenerating the layer to be processed at a higher temperature than conventionally. In a state where a substrate provided with a layer to be processed is heated, the substrate is supplied with vapor of a component that can decompose the layer to be processed, and thereafter the layer to be processed that has reacted with the component is removed from the substrate. As the component, a nitric acid or a sulfonic acid is preferable. As the sulfonic acid, a fluorinated alkyl sulfonic acid is preferable.


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