The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Dec. 08, 2005
Yoshihiro Sawada, Kawasaki, JP;
Jun Koshiyama, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Atsushi Miyamoto, Kawasaki, JP;
Hidekazu Tajima, Kawasaki, JP;
Yoshihiro Sawada, Kawasaki, JP;
Jun Koshiyama, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Atsushi Miyamoto, Kawasaki, JP;
Hidekazu Tajima, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa-Ken, JP;
Abstract
The invention provides a novel rinse solution used in the step of rinse treatment of a patterned photoresist layer developed with an aqueous alkaline developer solution in a photolithographic process for the manufacture of semiconductor devices and liquid crystal display panels. The rinse solution provided by the invention is an aqueous solution of a nitrogen-containing heterocyclic compound such as imidazoline, pyridine and the like in a concentration up to 10% by mass. Optionally, the rinse solution of the invention further contains a water-miscible alcoholic or glycolic organic solvent and/or a water-soluble resin. The invention also provides a lithographic method for the formation of a patterned photoresist layer including a step of rinse treatment of an alkali-developed resist layer with the rinse solution defined above. The invention provides an improvement on the lithographic process in respect of the product quality and efficiency of the process.