Company Filing History:
Years Active: 2010-2013
Title: Innovations by Hidekazu Tajima
Introduction
Hidekazu Tajima is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of lithography, particularly in the development of detergents and rinse solutions used in semiconductor manufacturing. With a total of five patents to his name, Tajima's work has had a considerable impact on the efficiency and quality of lithographic processes.
Latest Patents
Tajima's latest patents include a detergent for lithography and a method of forming a resist pattern using the same. This innovative detergent is an aqueous solution that contains nitrogenous cationic and ampholytic surfactants, along with an anionic surfactant. It effectively maintains low surface tension even at reduced concentrations, which helps in inhibiting pattern falling and defect occurrence. Another significant patent involves a lithographic rinse solution that enhances the quality of patterned photoresist layers. This rinse solution comprises a nitrogen-containing heterocyclic compound and can include additional solvents or resins to improve the lithographic process.
Career Highlights
Tajima is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work has been instrumental in improving the quality and efficiency of lithographic processes, which are crucial for the production of semiconductor devices and liquid crystal display panels.
Collaborations
Tajima has collaborated with notable coworkers such as Yoshihiro Sawada and Kazumasa Wakiya. Their combined expertise has contributed to the successful development of innovative solutions in the field of lithography.
Conclusion
Hidekazu Tajima's contributions to lithography through his patents and collaborations have significantly advanced the semiconductor manufacturing process. His innovative approaches continue to influence the industry positively.