The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Apr. 20, 2005
Jun Koshiyama, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Fumitake Kaneko, Kawasaki, JP;
Atsushi Miyamoto, Kawasaki, JP;
Hidekazu Tajima, Kawasaki, JP;
Yoshihiro Sawada, Kawasaki, JP;
Jun Koshiyama, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Fumitake Kaneko, Kawasaki, JP;
Atsushi Miyamoto, Kawasaki, JP;
Hidekazu Tajima, Kawasaki, JP;
Yoshihiro Sawada, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
A method of producing a high-quality product without damaging the physical properties of a pattern to be formed by a rinsing process based on a principle totally different from that for a conventional pattern collapse preventing method. A method for forming a resist pattern by subjecting a photo-resist layer provided on a substrate to image-forming exposure and then developing the resultant layer, wherein the resist pattern is formed, after the developing process, by the process of reducing a contact angle with respect to a contact liquid on the surface of the resist pattern to up to 40 degrees, then by the process of increasing it to at least 70 degrees, and further by drying it.