This inventor holds 27 USPTO granted patents and 3 published patent applications and 3 EPO patents, primarily in Photoresist Technology. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 1997-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hiratsuka, JP (1997 - 2001)
- Samukawa-machi, JP (2007)
- Kanagawa-ken, JP (2002 - 2009)
- Kanagawa, JP (2000 - 2012)
- Kawasaki, JP (2010 - 2015)
Company Filing History:
Years Active: 1997-2015
Areas of Expertise:
Title: Fumitake Kaneko: Innovating Resists in Semiconductor Technology
Introduction
Fumitake Kaneko is a prominent inventor based in Kanagawa-ken, Japan, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 27 patents, Kaneko has been instrumental in advancing the methods of producing resist compositions, which are critical in photolithography processes.
Latest Patents
Kaneko's latest patents include innovations related to a compound and methodology for producing acid generators, as well as resist compositions and methods for forming resist patterns. These compositions feature a base component that exhibits alterable solubility in an alkali developing solution under the influence of acid. The acid-generator component generates acid when exposed to light, comprising compounds that are represented by specific general formulas with various molecular characteristics.
Career Highlights
Fumitake Kaneko works at Tokyo Ohka Kogyo Co., Ltd., a leader in the manufacturing of photoresist products and other materials used in semiconductor fabrication. Over the years, he has made substantial impacts in the industry through his inventive work, elevating the capabilities of resist materials in high-tech applications.
Collaborations
Throughout his career, Kaneko has collaborated with fellow innovators, including Toshikazu Tachikawa and Katsumi Oomori. These partnerships have enriched the research and development process, fostering innovation and improving the technology behind resist compositions and methodologies.
Conclusion
Fumitake Kaneko’s contributions to the field of semiconductor technology through his patents on resist compositions and acid generators reflect his commitment to innovation. His work not only enhances manufacturing processes but also plays a vital role in the evolution of technology used in the semiconductor industry. With his extensive experience and collaboration with other inventors, Kaneko continues to be a pivotal figure in advancing semiconductor materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile