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For the Inventor, By the Inventor

Kanagawa-ken, Japan

Fumitake Kaneko

USPTO Granted Patents = 27 


Average Co-Inventor Count = 4.7

ph-index = 7

Forward Citations = 155(Granted Patents)


Location History:

  • Hiratsuka, JP (1997 - 2001)
  • Samukawa-machi, JP (2007)
  • Kanagawa-ken, JP (2002 - 2009)
  • Kanagawa, JP (2000 - 2012)
  • Kawasaki, JP (2010 - 2015)

Company Filing History:

goldMedal27 out of 1,233 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 1997-2015

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27 patents (USPTO):
1. 9040220 - Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern (2015-05-26),
2. 9034556 - Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern (2015-05-19),
3. 8206891 - Positive resist composition and method of forming resist pattern (2012-06-26),
4. 8187798 - Method of forming fine patterns (2012-05-29),
5. 8142980 - Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent (2012-03-27),
6. 8124318 - Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent (2012-02-28),
7. 7811748 - Resist pattern forming method and composite rinse agent (2010-10-12),
8. 7741260 - Rinsing fluid for lithography (2010-06-22),
9. 7553610 - Method of forming fine patterns (2009-06-30),
10. 7235345 - Agent for forming coating for narrowing patterns and method for forming fine pattern using the same (2007-06-26),
11. 7189499 - Method of forming fine patterns (2007-03-13),
12. 7033731 - Multilayered body for photolithographic patterning (2006-04-25),
13. 6864036 - Negative-working photoresist composition (2005-03-08),
14. 6811817 - Method for reducing pattern dimension in photoresist layer (2004-11-02),
15. 6544712 - Negative working resist composition (2003-04-08),

Title: Fumitake Kaneko: Innovating Resists in Semiconductor Technology

Introduction

Fumitake Kaneko is a prominent inventor based in Kanagawa-ken, Japan, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 27 patents, Kaneko has been instrumental in advancing the methods of producing resist compositions, which are critical in photolithography processes.

Latest Patents

Kaneko's latest patents include innovations related to a compound and methodology for producing acid generators, as well as resist compositions and methods for forming resist patterns. These compositions feature a base component that exhibits alterable solubility in an alkali developing solution under the influence of acid. The acid-generator component generates acid when exposed to light, comprising compounds that are represented by specific general formulas with various molecular characteristics.

Career Highlights

Fumitake Kaneko works at Tokyo Ohka Kogyo Co., Ltd., a leader in the manufacturing of photoresist products and other materials used in semiconductor fabrication. Over the years, he has made substantial impacts in the industry through his inventive work, elevating the capabilities of resist materials in high-tech applications.

Collaborations

Throughout his career, Kaneko has collaborated with fellow innovators, including Toshikazu Tachikawa and Katsumi Oomori. These partnerships have enriched the research and development process, fostering innovation and improving the technology behind resist compositions and methodologies.

Conclusion

Fumitake Kaneko’s contributions to the field of semiconductor technology through his patents on resist compositions and acid generators reflect his commitment to innovation. His work not only enhances manufacturing processes but also plays a vital role in the evolution of technology used in the semiconductor industry. With his extensive experience and collaboration with other inventors, Kaneko continues to be a pivotal figure in advancing semiconductor materials.

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