The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Nov. 05, 2002
Yoshiki Sugeta, Kanagawa, JP;
Fumitake Kaneko, Samukawa-machi, JP;
Toshikazu Tachikawa, Kanagawa, JP;
Yoshiki Sugeta, Kanagawa, JP;
Fumitake Kaneko, Samukawa-machi, JP;
Toshikazu Tachikawa, Kanagawa, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having photoresist patterns thereon and allowed to shrink under heat so that the spacing between the adjacent photoresist patterns is lessened, further characterized by containing a water-soluble polymer and a surfactant. Also disclosed is a method of forming fine-line patterns using the over-coating agent. According to the invention, one can obtain fine-line patterns which exhibit good profiles while satisfying the characteristics required of semiconductor devices, being excellent in controlling the dimension of patterns.