Yoshiki Sugeta is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of fine pattern formation, holding a total of 18 patents. His work focuses on enhancing the precision and efficiency of photoresist patterning techniques.

Latest Patents

Among his latest patents, Sugeta has developed a method of forming fine patterns. This method involves subjecting a substrate with photoresist patterns to a hydrophilic treatment. It includes covering the substrate with an over-coating agent designed for fine pattern formation. The process applies heat treatment to induce thermal shrinkage of the over-coating agent, effectively reducing the spacing between adjacent photoresist patterns. Additionally, he has disclosed an over-coating agent that comprises a water-soluble polymer containing methacrylic acid and/or methyl methacrylate. This agent allows for the formation of fine-line patterns while maintaining the integrity of the original photoresist pattern profile.

Career Highlights

Yoshiki Sugeta is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its innovations in the semiconductor and electronics industries. His work has significantly advanced the field of photolithography, particularly in the area of dimension control and patterning techniques.

Collaborations

Sugeta has collaborated with notable colleagues, including Toshikazu Tachikawa and Fumitake Kaneko. Their combined expertise has contributed to the development of advanced technologies in fine pattern formation.

Conclusion

Yoshiki Sugeta's innovative work in fine pattern formation has made a lasting impact on the field of photolithography. His patents reflect a commitment to enhancing precision in manufacturing processes, showcasing the importance of innovation in technology.

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