The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Oct. 22, 1999
Applicant:
Inventors:
Toshikazu Tachikawa, Kanagawa, JP;
Fumitake Kaneko, Kanagawa, JP;
Miwa Miyairi, Kanagawa, JP;
Masakazu Kobayashi, Kanagawa, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kanegawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 ;
U.S. Cl.
CPC ...
G03F 7/038 ;
Abstract
The present invention provides a negative working resist composition comprising a diazosulfonic acid compound capable of generating an acid with irradiation of radiation and an organic amine compound. The negative working resist composition is excellent in sensitivity, resist pattern profile, and aging stability.