Miwa Miyairi is an eminent inventor based in Kawasaki, Japan, known for her remarkable contributions to the field of materials science and photolithography. She holds an impressive portfolio of 17 patents, reflecting her commitment to innovation and excellence in her work. Miyairi's latest patents focus on positive type resist compositions, showcasing her expertise and creativity in developing advanced materials.

Latest Patents

One of Miyairi's significant contributions is her patent for a positive type resist composition and a resist pattern formation method using the same. This inventive composition consists of a resin component that incorporates a structural unit derived from (meth)acrylate esters, featuring an acid-dissociable, dissolution-inhibiting group with a polycyclic structure on its ester side chain. This unique design increases solubility in alkali when exposed to acid. Additionally, the composition includes an acid generator that produces acid upon exposure and an organic solvent. The result is a resist pattern characterized by minimal surface roughness and line edge roughness during etching, as well as excellent resolution and an extensive depth of focus range, underscoring the innovative nature of her work.

Career Highlights

Miwa Miyairi’s career has been marked by her role at Tokyo Ohka Kogyo Co., Ltd., where she has been instrumental in advancing the company’s research in photolithographic materials. Her dedication to innovation is evident in her numerous patents, which continue to influence practices in the field. With her deep understanding of materials, Miyairi has positioned herself as a pivotal figure in her industry.

Collaborations

Throughout her career, Miyairi has collaborated with notable peers, including Naotaka Kubota and Takeshi Iwai. These collaborations have not only enriched her work but also fostered an environment for shared knowledge and advancements in their respective fields. Working alongside talented individuals has allowed her to explore new ideas and push the boundaries of technology.

Conclusion

Miwa Miyairi’s contributions to the field of photolithography and materials science through her innovative patents and collaborative spirit exemplify her as a leading inventor. Her latest work in positive type resist compositions demonstrates her ability to blend chemistry and technology effectively, making a significant impact in her industry. As she continues to develop groundbreaking solutions, Miyairi undoubtedly stands out as an inspiring figure in the realm of innovation.

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