The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Jan. 29, 2004
Hideo Hada, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Miwa Miyairi, Kawasaki, JP;
Masaaki Muroi, Kawasaki, JP;
Kota Atsuchi, Kawasaki, JP;
Hiroaki Tomida, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Miwa Miyairi, Kawasaki, JP;
Masaaki Muroi, Kawasaki, JP;
Kota Atsuchi, Kawasaki, JP;
Hiroaki Tomida, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Nakahara-ku, Kawasaki-shi, Kanagawa-ken, JP;
Abstract
A process for refining a crude resin for a resist which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The refining process for the crude resin of resist resin (A) used in a photoresist composition includes at least the resist resin (A) and an acid generator (B) dissolved in a first organic solvent (C), such that if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution including the crude resin of the component (A) dissolved in a second organic solvent (C) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.