Kota Atsuchi is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of lithography through his innovative work on positive resist compositions. With a total of 6 patents to his name, Atsuchi continues to push the boundaries of technology in this area.

Latest Patents

Atsuchi's latest patents focus on a positive resist composition and a method of forming resist patterns. His work aims to provide a composition that has fewer defects and superior lithographic characteristics. The positive resist composition includes a resin component that exhibits increased alkali solubility under the action of an acid. Additionally, it features an acid-generating component that activates upon irradiation with radiation. This innovative approach allows for the formation of resist patterns with reduced levels of both bridge-type defects and reprecipitation-type defects.

Career Highlights

Throughout his career, Kota Atsuchi has worked with notable companies such as Tokyo Ohka Kogyo Co., Ltd. and Maruzen Petrochemical Company, Limited. His experience in these organizations has contributed to his expertise in developing advanced resist compositions.

Collaborations

Atsuchi has collaborated with esteemed colleagues, including Masaaki Muroi and Hideo Hada. These partnerships have fostered a collaborative environment that enhances innovation and research in the field.

Conclusion

Kota Atsuchi's contributions to the field of positive resist compositions demonstrate his commitment to innovation and excellence. His work continues to influence the lithography industry, paving the way for future advancements.

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