The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
May. 09, 2006
Takanori Yamagishi, Chiba, JP;
Tomo Oikawa, Chiba, JP;
Masaaki Muroi, Fukushima, JP;
Kota Atsuchi, Kanagawa, JP;
Takahiro Nakamura, Kanagawa, JP;
Masakazu Yamada, Kanagawa, JP;
Kensuke Saisyo, Kanagawa, JP;
Masaru Takeshita, Kanagawa, JP;
Takanori Yamagishi, Chiba, JP;
Tomo Oikawa, Chiba, JP;
Masaaki Muroi, Fukushima, JP;
Kota Atsuchi, Kanagawa, JP;
Takahiro Nakamura, Kanagawa, JP;
Masakazu Yamada, Kanagawa, JP;
Kensuke Saisyo, Kanagawa, JP;
Masaru Takeshita, Kanagawa, JP;
Maruzen Petrochemical Co., Ltd., Tokyo, JP;
Abstract
A copolymer for semiconductor lithography, comprising at least a recurring unit (A) having a carboxylic acid ester structure whose solubility in alkali increases by the action of an acid and a carboxyl group-containing recurring unit (B), which copolymer is obtained via a step (P) of (co)polymerizing at least a monomer giving a recurring unit (A) and a step (Q) of forming a recurring unit (B) in the co-presence of a recurring unit (A)-containing (co)polymer and/or a monomer giving a recurring unit (A), and an acid. The copolymer is used in production of semiconductor as a resist polymer which is small in roughness, little in development defect and superior in lithography properties such as DOF and the like.