The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Dec. 18, 2003
Hideo Hada, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Masaaki Shimazaki, Kawasaki, JP;
Masaaki Muroi, Kawasaki, JP;
Kota Atsuchi, Kawasaki, JP;
Hiroaki Tomida, Kawasaki, JP;
Hirokazu Ozaki, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Masaaki Shimazaki, Kawasaki, JP;
Masaaki Muroi, Kawasaki, JP;
Kota Atsuchi, Kawasaki, JP;
Hiroaki Tomida, Kawasaki, JP;
Hirokazu Ozaki, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Abstract
A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solution (storage stability); and a technique to obtain a photoresist composition which reduces the change of sensitivity and resist pattern size after treatment almost completely are provided. A photoresist composition containing a resin component (A), an acid-generating component (B) for generating an acid under exposure, and an organic solvent (C) is passed through a first filterequipped with a first membrane having zeta potential of more than −20 mV but no more than 15 mV in distilled water of pH 7.0.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile