This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Masaaki Shimazaki: Innovator in Photoresist Technology
Introduction
Masaaki Shimazaki is a prominent inventor based in Kawasaki, Japan. He is known for his significant contributions to the field of photoresist technology, which is crucial in the semiconductor manufacturing process. His innovative work has led to advancements that enhance the quality and reliability of photoresist compositions.
Latest Patents
Masaaki Shimazaki holds a patent for a "Process for producing photoresist composition, filter, coater and photoresist composition." This technique aims to acquire a photoresist composition that reduces the occurrence of defects in resist patterns after development. Additionally, it provides a method to obtain a photoresist composition with excellent storage stability characteristics. The invention also addresses the reduction of changes in sensitivity and resist pattern size after treatment. The photoresist composition includes a resin component (A), an acid-generating component (B) that generates acid under exposure, and an organic solvent (C). This composition is filtered through a first filter equipped with a membrane that has a zeta potential of more than -20 mV but no more than 15 mV in distilled water at pH 7.0.
Career Highlights
Masaaki Shimazaki is associated with Tokyo Ohka Kogyo Co., Ltd., a company renowned for its innovations in the field of photoresist materials. His work has significantly impacted the semiconductor industry, contributing to the development of more efficient and reliable manufacturing processes.
Collaborations
Masaaki has collaborated with notable colleagues, including Takeshi Iwai and Hideo Hada. Their combined expertise has fostered advancements in photoresist technology and has led to the successful implementation of innovative solutions in the industry.
Conclusion
Masaaki Shimazaki's contributions to photoresist technology exemplify the importance of innovation in the semiconductor field. His patented techniques not only enhance the quality of photoresist compositions but also pave the way for future advancements in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile