The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Apr. 26, 2006
Masaaki Muroi, Kawasaki, JP;
Kota Atsuchi, Kawasaki, JP;
Takahiro Nakamura, Kawasaki, JP;
Masakazu Yamada, Kawasaki, JP;
Kensuke Saisyo, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Takanori Yamagishi, Ichihara, JP;
Tomo Oikawa, Ichihara, JP;
Masaaki Muroi, Kawasaki, JP;
Kota Atsuchi, Kawasaki, JP;
Takahiro Nakamura, Kawasaki, JP;
Masakazu Yamada, Kawasaki, JP;
Kensuke Saisyo, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Takanori Yamagishi, Ichihara, JP;
Tomo Oikawa, Ichihara, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
Provided are a positive resist composition and a resist pattern forming method having fewer defects and superior lithographic characteristics. The positive resist composition includes a resin component (A) which has on a main chain a structural unit derived from an (α-lower alkyl)acrylate ester and exhibits increased alkali solubility under the action of an acid, and an acid generating component (B) which generates the acid upon irradiation with radiation, in which the resin component (A) is a copolymer having at least two structural units which is obtained by incorporating an acid when polymerizing at least one monomer for the production thereof.