The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2008
Filed:
Dec. 01, 2003
Hideo Hada, Kawasaki, JP;
Miwa Miyairi, Kawasaki, JP;
Naotaka Kubota, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Miwa Miyairi, Kawasaki, JP;
Naotaka Kubota, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd, Kawasaki-shi, JP;
Abstract
There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (a1) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.