The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2005

Filed:

Jun. 25, 2003
Applicants:

Ryoichi Takasu, Kawasaki, JP;

Miwa Miyairi, Kawasaki, JP;

Jun Iwashita, Kawasaki, JP;

Toshikazu Tachikawa, Kawasaki, JP;

Inventors:

Ryoichi Takasu, Kawasaki, JP;

Miwa Miyairi, Kawasaki, JP;

Jun Iwashita, Kawasaki, JP;

Toshikazu Tachikawa, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/004 ;
U.S. Cl.
CPC ...
Abstract

A negative resist composition is provided which is less likely to swell in an alkali developing solution. An alkali-developable negative resist composition is disclosed comprising a compound (A) which generates an acid upon exposure to radiation, and a resin component (B) which becomes insoluble in alkali under the action of an acid, wherein the component (B) is a resin component containing: (b1) a unit which becomes insoluble in an alkali solution as a result of the formation of a lactone under the action of an acid generated from the component (A), and (b2) a unit having an alcoholic hydroxyl group.


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