Kawasaki, Japan

Ryoichi Takasu


Average Co-Inventor Count = 6.2

ph-index = 4

Forward Citations = 83(Granted Patents)


Location History:

  • Kanagawa, JP (2008)
  • Kawasaki, JP (2005 - 2012)

Company Filing History:


Years Active: 2005-2012

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10 patents (USPTO):

Title: Ryoichi Takasu: Innovator in Resist Composition Technology

Introduction

Ryoichi Takasu is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist composition technology, holding a total of 10 patents. His work focuses on enhancing the performance and stability of resist compositions used in advanced lithography processes.

Latest Patents

Among his latest patents, Takasu has developed a resist composition that is stable relative to solvents used in immersion lithography processes. This composition exhibits excellent sensitivity and a superior resist pattern profile. The resist composition adheres to predetermined parameters and includes a positive resist composition comprising a resin component that contains an acid dissociable, dissolution inhibiting group. This component displays increased alkali solubility under the action of acid. Additionally, he has created a fluorine-containing compound that is integral to the resist composition for immersion exposure, which is represented by a specific general formula.

Career Highlights

Ryoichi Takasu is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its innovations in the field of photolithography materials. His work has been instrumental in advancing the capabilities of resist compositions, which are critical for the semiconductor manufacturing process.

Collaborations

Throughout his career, Takasu has collaborated with notable colleagues, including Mitsuru Sato and Masaaki Yoshida. These collaborations have further enriched his research and development efforts in resist technology.

Conclusion

Ryoichi Takasu's contributions to resist composition technology have positioned him as a key figure in the field. His innovative patents continue to influence the semiconductor industry, showcasing the importance of his work in advancing lithography processes.

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