The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Feb. 06, 2007
Taku Hirayama, Kawasaki, JP;
Ryoichi Takasu, Kawasaki, JP;
Mitsuru Sato, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Masaaki Yoshida, Kawasaki, JP;
Koki Tamura, Kawasaki, JP;
Taku Hirayama, Kawasaki, JP;
Ryoichi Takasu, Kawasaki, JP;
Mitsuru Sato, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Masaaki Yoshida, Kawasaki, JP;
Koki Tamura, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-Shi, JP;
Abstract
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.