The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
May. 13, 2004
Taku Hirayama, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Satoshi Fujimura, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Mitsuru Sato, Kawasaki, JP;
Ryoichi Takasu, Kawasaki, JP;
Toshikazu Tachikawa, Kawasaki, JP;
Jun Iwashita, Kawasaki, JP;
Keita Ishiduka, Kawasaki, JP;
Tomotaka Yamada, Kawasaki, JP;
Toshikazu Takayama, Kawasaki, JP;
Masaaki Yoshida, Kawasaki, JP;
Taku Hirayama, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Satoshi Fujimura, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Mitsuru Sato, Kawasaki, JP;
Ryoichi Takasu, Kawasaki, JP;
Toshikazu Tachikawa, Kawasaki, JP;
Jun Iwashita, Kawasaki, JP;
Keita Ishiduka, Kawasaki, JP;
Tomotaka Yamada, Kawasaki, JP;
Toshikazu Takayama, Kawasaki, JP;
Masaaki Yoshida, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a), including structural units (a-) containing an anhydride of a dicarboxylic acid and structural units (a-) containing a phenolic hydroxyl group.