The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Nov. 29, 2005
Yoshihiro Sawada, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Jun Koshiyama, Kawasaki, JP;
Atsushi Miyamoto, Kawasaki, JP;
Hidekazu Tajima, Kawasaki, JP;
Yoshihiro Sawada, Kawasaki, JP;
Kazumasa Wakiya, Kawasaki, JP;
Jun Koshiyama, Kawasaki, JP;
Atsushi Miyamoto, Kawasaki, JP;
Hidekazu Tajima, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
This invention provides a novel cleaning liquid for lithography that, for a photoresist pattern, is used for reducing a surface defect, that is, defect, of a product, preventing pattern collapse during water rinsing, and further imparting electron beam irradiation resistance to a resist to suppress pattern shrinkage. Further, in the novel cleaning liquid for lithography, bacteria contamination does not occur during storage. The cleaning liquid for lithography comprises an aqueous solution containing an amine oxide compound represented by general formula wherein Rrepresents an alkyl or hydroxyalkyl group having 8 to 20 carbon atoms which may be interrupted by an oxygen atom; and Rand Rrepresent an alkyl or hydroxyalkyl group having 1 to 5 carbon atoms.