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Kanagawa, Japan

Toshimasa Nakayama

USPTO Granted Patents = 111

Average Co-Inventor Count = 4.5

ph-index = 16

Forward Citations = 1,006(Granted Patents)

Forward Citations (Not Self Cited) = 962(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Hiratsuka, JP (1988 - 2001)
Chigasaki, JP (1994 - 2001)
Kanagawa-ken, JP (1996 - 2001)
Kanagawa, JP (1995 - 2005)

Company Filing History:

111 out of 1,234

Tokyo Ohka Kogyo Co., Ltd.

Years Active: 1988-2005

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Areas of Expertise:

Photoresist Composition

Positive Photoresist

Novolak Resin

Lithography

Chemical-Sensitization

Antireflective Coating

Substrate Treatment

Patterning Method

Polyphenol Compound

Developer Solution

Resist Pattern Formation

Negative-Working Resist

111 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6939926 - Phenol novolak resin, production process thereof, and positive photoresist composition using the same (2005-09-06),

2. 6815151 - Rinsing solution for lithography and method for processing substrate with the use of the same (2004-11-09),

3. 6620978 - Positive photoresist composition and process for synthesizing polyphenol compound (2003-09-16),

4. 6566031 - Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern (2003-05-20),

5. 6492085 - Positive photoresist composition and process and synthesizing polyphenol compound (2002-12-10),

6. 6475694 - Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group (2002-11-05),

7. 6417317 - Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin (2002-07-09),

8. 6406827 - Positive photoresist composition and process for forming resist pattern (2002-06-18),

9. 6379859 - Positive photoresist composition and process for forming resist pattern using same (2002-04-30),

10. 6329126 - Developer solution for acitinic ray sensitive resist (2001-12-11),

11. 6312863 - Positive photoresist composition (2001-11-06),

12. 6300033 - Positive photoresist composition and process for forming resist pattern (2001-10-09),

13. 6296992 - Positive photoresist composition and process for forming contact hole (2001-10-02),

14. 6291142 - Photoresist stripping liquid compositions and a method of stripping photoresists using the same (2001-09-18),

15. 6268108 - Composition for forming antireflective coating film and method for forming resist pattern using same (2001-07-31),

Title: The Innovative Journey of Toshimasa Nakayama

Introduction:

Toshimasa Nakayama, a pioneering inventor hailing from Kanagawa, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents:

Nakayama's latest patents focus on advancements in artificial intelligence algorithms for autonomous vehicles, revolutionizing the way we perceive transportation and safety on the roads.

Career Highlights:

With a career spanning over two decades, Nakayama has been at the forefront of technological advancements. His work in developing cutting-edge robotics for industrial applications has garnered international acclaim.

Collaborations:

Nakayama has collaborated with leading research institutions and tech companies to further his inventions. His partnerships have led to the development of state-of-the-art medical devices and smart home technologies.

Conclusion:

In conclusion, Toshimasa Nakayama's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor in the global tech landscape.

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