The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Feb. 09, 2004
Ken Miyagi, Kanagawa, JP;
Yasuhide Ohuchi, Kanagawa, JP;
Atsuko Hirata, Kanagawa, JP;
Kousuke Doi, Kanagawa, JP;
Hidekatsu Kohara, Kanagawa, JP;
Toshimasa Nakayama, Kanagawa, JP;
Ken Miyagi, Kanagawa, JP;
Yasuhide Ohuchi, Kanagawa, JP;
Atsuko Hirata, Kanagawa, JP;
Kousuke Doi, Kanagawa, JP;
Hidekatsu Kohara, Kanagawa, JP;
Toshimasa Nakayama, Kanagawa, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
A phenol novolak resin has a peak intensity ratio of ortho-ortho bond (o-o)/ortho-para bond (o-p)/para-para bond (p-p) in a resin structure not substantially varying in each molecular weight fraction and has a weight average molecular weight (Mw) of 3000 to 20000 in terms of polystyrene, which peak intensity ratio is detected byC-NMR analysis. The phenol novolak resin can form both dense pattern and isolation pattern with good shapes in the formation of a fine resist pattern of not more than 0.35 μm and has satisfactory sensitivity, definition, and focal depth range properties, and has a resin composition being uniform in each molecular weight fraction. A process for producing the phenol novolak resin, and a positive photoresist composition using the resin are also provided.