Kanagawa, Japan

Atsuko Hirata


Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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3 patents (USPTO):Explore Patents

Title: Innovations of Atsuko Hirata: Pioneering Advances in Photoresist Technology

Introduction: Atsuko Hirata, a notable inventor based in Kanagawa, Japan, has made significant contributions to the field of materials science with a focus on photoresist technology. With three patents to her name, Hirata's work is prominent in the realm of fine pattern formation, which is crucial for the semiconductor industry.

Latest Patents: Among her latest innovations is a patent for a phenol novolak resin, which exhibits a peak intensity ratio of ortho-ortho bonds to ortho-para and para-para bonds, essential for producing high-performance photoresists. This resin can achieve precise patterns of less than 0.35 μm and boasts impressive sensitivity, definition, and focal depth properties. Additionally, she has developed a positive photoresist composition that includes a phenolic compound with both an acid-decomposable group and a naphthoquinonediazide sulfonyl group, designed to create fine patterns in photolithographic processes, particularly when utilizing light with a wavelength of 365 nm.

Career Highlights: Atsuko Hirata's career has been strongly tied to Tokyo Ohka Kogyo Co., Ltd., where she has been instrumental in advancing their photoresist technologies. Her innovative patents reflect a deep understanding of chemical engineering and material properties, positioning her as a key figure in the company and the industry at large.

Collaborations: Throughout her career, Hirata has collaborated with other esteemed professionals such as Ken Miyagi and Kousuke Doi. These partnerships have facilitated the exchange of ideas and technical expertise, furthering the development of cutting-edge materials that play critical roles in the electronics sector.

Conclusion: Atsuko Hirata’s contributions to photoresist technology have significantly impacted the semiconductor industry, showcasing her innovative spirit and technical prowess. Her patents demonstrate a commitment to advancing material sciences, ensuring her place as a prominent inventor in her field.

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