Location History:
- Samukawa, JP (1995)
- Kanagawa-ken, JP (1997 - 1998)
- Kanagawa, JP (1995 - 2005)
- Kawasaki, JP (2006 - 2008)
Company Filing History:
Years Active: 1995-2008
Title: Kousuke Doi: Innovating Photoresist Technology in Kanagawa
Introduction
Kousuke Doi is a prominent inventor based in Kanagawa, Japan, known for his significant contributions to the field of photoresist technology. With an impressive portfolio of 33 patents, Doi's work has played a crucial role in advancing the capabilities of photoresist compositions used in various applications, particularly within the semiconductor industry.
Latest Patents
Among his latest patents, one notable invention is the "Chemically Amplified Positive Photo Resist Composition and Method for Forming Resist Pattern." This invention showcases a chemical amplification type positive photoresist composition characterized by excellent storage stability, enhancing solubility in aqueous alkali solutions when acids are present. The formulation includes a novolak resin or hydroxystyrenic resin reacted with a crosslinking agent, combined with a compound that generates acid upon radiation exposure.
Another significant patent is the "Novolak Resin Solution, Positive Photoresist Composition and Preparation Method Thereof." This patent describes a method for producing resist compositions that maintain good storage stability and consistent performance across production lots. The innovation involves the addition of benzoquinone to a novolak resin solution, leading to the creation of robust positive photoresist compositions.
Career Highlights
Kousuke Doi is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company renowned for its innovative solutions in photoresist materials and technology. His work has established him as a leader in the development of advanced resist compositions, ultimately contributing to the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Doi has collaborated with esteemed colleagues, including Hidekatsu Kohara and Toshimasa Nakayama. These partnerships have facilitated the exchange of ideas and technologies, further advancing the field of photoresist innovation.
Conclusion
Kousuke Doi's extensive experience and dedication to the field of photoresist technology have resulted in numerous patents that enhance the capabilities of materials used in semiconductor applications. His innovative spirit and collaboration with other experts continue to drive advancements in the realm of photoresist compositions, making significant contributions to the industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.