The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Nov. 15, 2002
Applicant:
Inventors:
Akira Katano, Kanagawa, JP;
Yusuke Nakagawa, Kanagawa, JP;
Shinichi Kono, Kanagawa, JP;
Kousuke Doi, Kanagawa, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 ; G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/023 ; G03F 7/30 ;
Abstract
A composition includes (A) a novolak resin containing at least 20% by mole of a m-cresol repeating unit and having a 1-ethoxyethyl group substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) a quinonediazide ester of, for example, the following formula, and (C) 1,1-bis(4-hydroxyphenyl)cyclohexane.
Katano, Akira. (2004). Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process (U.S. Patent No. 6756178). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6756178
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile