Location History:
- Kanagawa-ken, JP (1997 - 2000)
- Kanagawa, JP (2004)
Company Filing History:
Years Active: 1997-2004
Title: The Innovations of Shinichi Kono
Introduction
Shinichi Kono, an accomplished inventor based in Kanagawa, Japan, holds a significant portfolio of four patents. His contributions to the field of photoresist compositions have advanced the technology used in semiconductor processing, demonstrating the critical role of innovative solutions in modern manufacturing.
Latest Patents
Kono's latest patents focus on positive photoresist compositions and methods of patterning resist thin films, particularly for inclined implantation processes. One of his notable inventions involves a composition that includes (A) an alkali-soluble resin with a molecular weight ranging from 1,500 to 10,000, (B) a quinonediazide ester, and (C) a phenolic compound with an acid-decomposable group. This composition allows for the creation of a resin film that dissolves rapidly in a specific aqueous solution, enhancing the efficiency of the manufacturing process.
Another recent patent details a positive photoresist composition that features a novolak resin with a substantial m-cresol repeating unit and specific substituents to improve functionality. This advanced formulation is key to creating high-quality thin films utilized in precision applications.
Career Highlights
Shinichi Kono's work at Tokyo Ohka Kogyo Co., Ltd. has positioned him as a leader in his field. His focused innovations in photoresist technology have not only contributed to the company’s success but also to the broader semiconductor industry. Kono's patents exemplify the importance of innovative approaches in tackling complex challenges in semiconductor manufacturing.
Collaborations
Throughout his career, Kono has collaborated with talented coworkers, including Hayato Ohno and Hidekatsu Kohara. This teamwork has been instrumental in refining their collective inventions and enhancing the practical applications of their research.
Conclusion
Shinichi Kono's inventive work in the area of photoresist compositions stands as a testament to his expertise and commitment to innovation. His contributions continue to shape the landscape of semiconductor technology, reflecting the critical interplay of creativity and technical knowledge in driving progress within the industry.