Akira Katano

Title: Akira Katano: Innovator in Photoresist Technology

Introduction

Akira Katano is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of cleaning solvents and positive photoresist compositions. With a total of 5 patents to his name, Katano continues to push the boundaries of innovation in his industry.

Latest Patents

One of Katano's latest patents is a solvent for cleaning that offers particularly superior results for cleaning pigment-dispersed photosensitive resin compositions used for forming color filters and black matrix patterns. This solvent has a hydrogen bonding parameter (δ) among the Hansen solubility parameters that falls within a range from 5 to 10. Another notable patent is a positive photoresist composition that includes an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, an ester of a compound represented by a specific formula with a naphthoquinonediazidosulfonyl compound, and a sensitizer.

Career Highlights

Katano is currently employed at Tokyo Ohka Kogyo Co., Ltd., where he has been instrumental in advancing the company's research and development efforts. His work has not only enhanced the company's product offerings but has also contributed to the broader field of semiconductor manufacturing.

Collaborations

Throughout his career, Katano has collaborated with talented individuals such as Kousuke Doi and Yusuke Nakagawa. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Akira Katano's contributions to photoresist technology exemplify the spirit of innovation. His patents and collaborative efforts continue to shape the future of the industry.