The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Apr. 01, 2002
Applicants:
Jyunichi Mizuta, Kanagawa, JP;
Kouji Yonemura, Kanagawa, JP;
Akira Katano, Kanagawa, JP;
Satoshi Niikura, Kanagawa, JP;
Kousuke Doi, Kanagawa, JP;
Inventors:
Jyunichi Mizuta, Kanagawa, JP;
Kouji Yonemura, Kanagawa, JP;
Akira Katano, Kanagawa, JP;
Satoshi Niikura, Kanagawa, JP;
Kousuke Doi, Kanagawa, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/023 ;
U.S. Cl.
CPC ...
Abstract
A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer: