The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2005

Filed:

Apr. 01, 2002
Applicants:

Jyunichi Mizuta, Kanagawa, JP;

Kouji Yonemura, Kanagawa, JP;

Akira Katano, Kanagawa, JP;

Satoshi Niikura, Kanagawa, JP;

Kousuke Doi, Kanagawa, JP;

Inventors:

Jyunichi Mizuta, Kanagawa, JP;

Kouji Yonemura, Kanagawa, JP;

Akira Katano, Kanagawa, JP;

Satoshi Niikura, Kanagawa, JP;

Kousuke Doi, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/023 ;
U.S. Cl.
CPC ...
Abstract

A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer:


Find Patent Forward Citations

Mizuta, Jyunichi. (2005). Positive photoresist composition (U.S. Patent No. 6869742). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6869742

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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