Kanagawa, Japan

Satoshi Niikura


Average Co-Inventor Count = 5.3

ph-index = 4

Forward Citations = 43(Granted Patents)


Location History:

  • Samukawa, JP (1994 - 1995)
  • Kanagawa-ken, JP (1998)
  • Kanagawa, JP (1996 - 2005)
  • Kawasaki, JP (2008)

Company Filing History:


Years Active: 1994-2008

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15 patents (USPTO):Explore Patents

Title: Innovations of Satoshi Niikura: A Pioneer in Photoresist Technology

Introduction

Satoshi Niikura, a prominent inventor based in Kanagawa, Japan, has made significant contributions to the field of chemical engineering and materials science. With an impressive portfolio of 15 patents, Niikura has focused primarily on the development of advanced photoresist compositions essential for various industrial applications, particularly in the semiconductor industry.

Latest Patents

Among his latest innovations is a groundbreaking patent for a chemically amplified positive photoresist composition and method for forming resist patterns. This invention provides a chemical amplification type positive photoresist composition that showcases excellent storage stability as a resist solution in a bottle. The patent describes a process where a novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent, resulting in a resin that exhibits improved solubility in an aqueous alkali solution when in the presence of an acid. This composition, which is dissolved in an organic solvent, is remarkable for having an acid component content of 10 ppm or less. Additionally, he has developed another positive photoresist composition which includes an alkali-soluble resin, a quinonediazide ester, and a further compound that enhances sensitivity and definition while reducing shrinkage.

Career Highlights

Satoshi Niikura currently works at Tokyo Ohka Kogyo Co., Ltd., a leading company in the manufacturing of chemical products for the electronics sector. His role in the company has allowed him to advance his research and expand the application of his patented technologies, reinforcing his status as an influential figure in the realm of photoresist materials.

Collaborations

Throughout his career, Niikura has collaborated with esteemed colleagues, including Hidekatsu Kohara and Toshimasa Nakayama. Their combined expertise has facilitated the development of innovative solutions in photoresist technology, contributing significantly to advancements in the semiconductor manufacturing process.

Conclusion

Satoshi Niikura's work exemplifies the spirit of innovation in the materials science domain. His contributions to the development of photoresist compositions are not only integral to the semiconductor industry but also pave the way for future advancements in related technologies. As an inventor dedicated to enhancing material applications, Niikura continues to inspire new generations of engineers and scientists.

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