The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 1998

Filed:

May. 23, 1996
Applicant:
Inventors:

Hiroshi Hosoda, Kanagawa-ken, JP;

Satoshi Niikura, Kanagawa-ken, JP;

Atsushi Sawano, Kanagawa-ken, JP;

Tatsuya Hashiguchi, Kanagawa-ken, JP;

Kazuyuki Nitta, Kanagawa-ken, JP;

Hidekatsu Kohara, Kanagawa-ken, JP;

Toshimasa Nakayama, Kanagawa-ken, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430192 ; 430165 ; 430190 ; 430191 ; 430193 ;
Abstract

A positive photoresist composition comprising (A) an alkali-soluble resin and (B) a light-sensitive component comprising at least one compound represented by the following general formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms or an alkoxy group having 1-3 carbon atoms; R.sup.4 is a hydrogen atom or an alkyl group having 1-3 carbon atoms; a, b and c are an integer of 1-3; l, m and n are an integer of 1-3, in which at least part of the hydroxyl groups present are esterified with a quinonediazidosulfonic acid and a sulfonic acid which has a group represented by the following formula (II):


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