Location History:
- Chigasaki, JP (1998)
- Kanagawa-ken, JP (1998)
Company Filing History:
Years Active: 1998
Title: Tatsuya Hashiguchi: Innovator in Photoresist Technology
Introduction
Tatsuya Hashiguchi is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 3 patents. His work focuses on developing advanced materials that enhance the performance of photoresists used in various applications.
Latest Patents
Hashiguchi's latest patents include a novel photoresist composition that features a film-forming resinous compound. This compound undergoes a change in solubility in an alkaline solution when exposed to an acid. Additionally, he has developed a positive photoresist composition that comprises an alkali-soluble resin and a light-sensitive component. This component includes compounds that are essential for creating high-quality photoresist materials.
Career Highlights
Throughout his career, Tatsuya Hashiguchi has been associated with Tokyo Ohka Kogyo Co., Ltd., a leading company in the field of photoresist materials. His innovative approaches and dedication to research have positioned him as a key figure in the industry.
Collaborations
Hashiguchi has collaborated with notable colleagues, including Toshimasa Nakayama and Hideo Hada. These partnerships have furthered advancements in photoresist technology and contributed to the success of their projects.
Conclusion
Tatsuya Hashiguchi's contributions to photoresist technology exemplify his commitment to innovation and excellence. His patents and collaborations continue to influence the industry and pave the way for future advancements.