Kanagawa, Japan

Atsushi Sawano

USPTO Granted Patents = 13 

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 36(Granted Patents)


Location History:

  • Fujisawa, JP (1996)
  • Kanagawa-ken, JP (1998 - 2000)
  • Kanagawa, JP (2001 - 2013)
  • Kawasaki, JP (2012 - 2013)

Company Filing History:


Years Active: 1996-2013

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13 patents (USPTO):Explore Patents

Title: Innovator Atsushi Sawano: Pioneering Advanced Material Solutions

Introduction

Atsushi Sawano, an accomplished inventor based in Kanagawa, Japan, has made significant contributions to the field of material science through his innovative patents. With a remarkable portfolio comprising 13 patents, he stands out as a prominent figure within the industry.

Latest Patents

Sawano's latest inventions underline his expertise in creating advanced compositions for antireflection films and detergents for lithography. One of his notable patents, "Composition for antireflection film formation and method for resist pattern formation using the composition," introduces a user-friendly composition that forms an anti-reflection film superior in optical characteristics. This innovative formula includes a certain fluorine compound that enhances the film’s performance, promising significant advancements in resist film technology.

Another one of his key patents, "Detergent for lithography and method of forming resist pattern with the same," addresses challenges faced by conventional detergents. By utilizing a unique combination of nitrogenous cationic and ampholytic surfactants along with an anionic surfactant, this aqueous solution maintains low surface tension at reduced concentrations, effectively inhibiting pattern falling and dimensional fluctuations common in traditional methods.

Career Highlights

Currently, Atsushi Sawano is employed at Tokyo Ohka Kogyo Co., Ltd., a company recognized for its innovative contributions to the chemical and materials sectors. His work continues to push the boundaries of technology, offering promising solutions to complex problems within lithography and resist applications.

Collaborations

Throughout his career, Sawano has collaborated with notable professionals, including Hidekatsu Kohara and Toshimasa Nakayama. Their combined expertise fosters a productive research environment, allowing for the development of groundbreaking innovations that benefit various industry sectors.

Conclusion

Atsushi Sawano exemplifies the spirit of innovation with his extensive patent portfolio and significant contributions to materials science. As he continues to explore new frontiers in technology, his work not only enhances existing processes but also paves the way for future advancements across the industry.

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