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Kanagawa, Japan

Hidekatsu Kohara

USPTO Granted Patents = 56

Average Co-Inventor Count = 4.6

ph-index = 11

Forward Citations = 380(Granted Patents)

Forward Citations (Not Self Cited) = 355(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Chigasaki, JP (1988 - 1996)
Kanagawa-ken, JP (1997 - 2000)
Kanagawa, JP (1988 - 2005)

Company Filing History:

56 out of 1,234

Tokyo Ohka Kogyo Co., Ltd.

Years Active: 1988-2005

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Areas of Expertise:

Positive Photoresist Composition

Copolymers

Phenol Novolak Resin

Polyphenol Compounds

Lithographic Patterning

High Aspect Ratio Patterns

Multilayer Resist Materials

Electron Beam-Curable Resists

Photosensitive Films

Silylation Techniques

Naphthoquinonediazide Compounds

Alkali-Developable Resins

56 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6939926 - Phenol novolak resin, production process thereof, and positive photoresist composition using the same (2005-09-06),

2. 6884566 - Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio (2005-04-26),

3. 6620978 - Positive photoresist composition and process for synthesizing polyphenol compound (2003-09-16),

4. 6566031 - Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern (2003-05-20),

5. 6517993 - Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio (2003-02-11),

6. 6492085 - Positive photoresist composition and process and synthesizing polyphenol compound (2002-12-10),

7. 6475694 - Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group (2002-11-05),

8. 6417317 - Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin (2002-07-09),

9. 6406827 - Positive photoresist composition and process for forming resist pattern (2002-06-18),

10. 6379859 - Positive photoresist composition and process for forming resist pattern using same (2002-04-30),

11. 6312863 - Positive photoresist composition (2001-11-06),

12. 6300033 - Positive photoresist composition and process for forming resist pattern (2001-10-09),

13. 6296992 - Positive photoresist composition and process for forming contact hole (2001-10-02),

14. 6207788 - Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin (2001-03-27),

15. 6207340 - Positive photoresist composition and process for forming contact hole (2001-03-27),

Title: The Innovative Journey of Hidekatsu Kohara

Introduction: Hidekatsu Kohara is a pioneering inventor hailing from Kanagawa, Japan. His relentless pursuit of innovation has led to groundbreaking developments in various fields.

Latest Patents: Hidekatsu Kohara's recent patents include cutting-edge technologies in the automotive industry, renewable energy sector, and healthcare innovations.

Career Highlights: With a career spanning over two decades, Kohara has established himself as a visionary inventor with a keen eye for identifying gaps in the market and creating solutions that push the boundaries of technology.

Collaborations: Throughout his career, Hidekatsu Kohara has collaborated with leading research institutions, universities, and multinational companies to bring his inventions to life. His ability to work in diverse teams has been instrumental in the success of his projects.

Conclusion: Hidekatsu Kohara's contributions to the world of innovation are truly remarkable, and his passion for creating a positive impact through his inventions is an inspiration to aspiring inventors worldwide.

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