The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
May. 19, 2004
Kenji Maruyama, Kawasaki, JP;
Masaki Kurihara, Kawasaki, JP;
Ken Miyagi, Kawasaki, JP;
Satoshi Niikura, Kawasaki, JP;
Satoshi Shimatani, Kawasaki, JP;
Masahiro Masujima, Kawasaki, JP;
Kazuyuki Nitta, Kawasaki, JP;
Toshihiro Yamaguchi, Kawasaki, JP;
Kousuke Doi, Kawasaki, JP;
Kenji Maruyama, Kawasaki, JP;
Masaki Kurihara, Kawasaki, JP;
Ken Miyagi, Kawasaki, JP;
Satoshi Niikura, Kawasaki, JP;
Satoshi Shimatani, Kawasaki, JP;
Masahiro Masujima, Kawasaki, JP;
Kazuyuki Nitta, Kawasaki, JP;
Toshihiro Yamaguchi, Kawasaki, JP;
Kousuke Doi, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that solubility in an aqueous alkali solution is enhanced in the presence of an acid, which is then dissolved in an organic solvent, together with (B) a compound generating an acid under irradiation with radiation to obtain a chemical amplification type positive photoresist composition wherein the content of an acid component is 10 ppm or less.