This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Jyunichi Mizuta: Innovator in Photoresist Technology
Introduction
Jyunichi Mizuta is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of photoresist technology, particularly through his innovative patent.
Latest Patents
Mizuta holds a patent for a positive photoresist composition. This composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of a compound represented by a specific formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer. His work in this area has advanced the capabilities of photoresist materials used in various applications.
Career Highlights
Jyunichi Mizuta is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its expertise in chemical products for the semiconductor industry. His role at the company has allowed him to focus on developing innovative solutions that enhance the performance of photoresist materials.
Collaborations
Mizuta has collaborated with notable colleagues, including Kouji Yonemura and Akira Katano. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Jyunichi Mizuta's contributions to photoresist technology exemplify the impact of innovative thinking in the field of materials science. His patent and collaborations highlight the importance of teamwork in driving advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile