Kouji Yonemura

Title: The Innovations of Kouji Yonemura

Introduction

Kouji Yonemura is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of photoresist compositions, which are essential in the semiconductor manufacturing process. With a total of 2 patents, his work has had a notable impact on the industry.

Latest Patents

Yonemura's latest patents include a positive resist composition and a resist pattern formation method. The positive resist composition features a resin component whose alkaline solubility changes due to the action of an acid. This composition includes an acid generator component and polypropylene glycol. Additionally, the resin component consists of various constitutional units, including those with acid dissociable dissolution inhibiting groups. Another significant patent is the positive photoresist composition, which comprises an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups, an ester of a specific compound, and a sensitizer.

Career Highlights

Kouji Yonemura is currently employed at Tokyo Ohka Kogyo Co., Ltd., a leading company in the field of photoresist materials. His work at this company has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Yonemura has collaborated with notable colleagues, including Jyunichi Mizuta and Akira Katano. These collaborations have contributed to the advancement of technology in the field of photoresists.

Conclusion

Kouji Yonemura's contributions to the field of photoresist compositions demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving semiconductor manufacturing processes, making him a significant figure in the industry.