The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2011
Filed:
Nov. 21, 2006
Applicants:
Kousuke Yoshihara, Koshi, JP;
Junji Nakamura, Koshi, JP;
Hirofumi Takeguchi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Inventors:
Kousuke Yoshihara, Koshi, JP;
Junji Nakamura, Koshi, JP;
Hirofumi Takeguchi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 7/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.