The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Jul. 15, 2009
Junji Nakamura, Koshi-Machi, JP;
Kousuke Yoshihara, Koshi-Machi, JP;
Kentaro Yamamura, Koshi-Machi, JP;
Fumiko Iwao, Koshi-Machi, JP;
Hirofumi Takeguchi, Koshi-Machi, JP;
Junji Nakamura, Koshi-Machi, JP;
Kousuke Yoshihara, Koshi-Machi, JP;
Kentaro Yamamura, Koshi-Machi, JP;
Fumiko Iwao, Koshi-Machi, JP;
Hirofumi Takeguchi, Koshi-Machi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A cleaning method of cleaning a surface of a substrate that is processed by a developing process. The method includes pouring a cleaning liquid onto a central part of the substrate. A dry area that is not wetted with the cleaning liquid is created in a central part of the substrate by stopping pouring the cleaning liquid or by shifting a cleaning liquid pouring position to which the cleaning liquid is poured from the central part while the substrate holding device is rotating. The dry area is expanded outward from the central part of the substrate by rotating the substrate holding device at a rotating speed not lower than 1500 rpm without pouring the cleaning liquid onto the dry area. The cleaning liquid is poured onto an outer area contiguously surrounding the dry area on the surface of the substrate.