Location History:
- Koshi-Machi, JP (2009 - 2011)
- Nirasaki, JP (2012 - 2016)
- Tokyo, JP (2017)
Company Filing History:
Years Active: 2009-2017
Title: Fumiko Iwao: Innovator in Film Forming Technologies
Introduction
Fumiko Iwao is a prominent inventor based in Nirasaki, Japan. She has made significant contributions to the field of film forming technologies, holding a total of 10 patents. Her work focuses on innovative methods for creating organic films on substrates, which are essential in various technological applications.
Latest Patents
Iwao's latest patents include a film forming method, computer storage medium, and film forming system. The film forming method involves applying an organic material onto a substrate with a pre-formed pattern. This process includes thermally treating the organic material to create an organic film and performing ultraviolet irradiation processing to remove the surface of the organic film to a predetermined depth. This innovative approach allows for the efficient formation of organic films on substrates. Another notable patent is the substrate treatment method, which utilizes photolithography to form a resist pattern on a substrate. This method ensures that a treatment agent infiltrates the side surface of the resist pattern, allowing for metal infiltration while maintaining a high etching selection ratio to prevent pattern collapse.
Career Highlights
Fumiko Iwao is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. Her work at the company has been instrumental in advancing film forming technologies, contributing to the development of more efficient and effective manufacturing processes.
Collaborations
Iwao has collaborated with notable colleagues such as Satoru Shimura and Kousuke Yoshihara. These collaborations have further enhanced her research and development efforts, leading to innovative solutions in her field.
Conclusion
Fumiko Iwao's contributions to film forming technologies have established her as a key figure in the industry. Her innovative patents and collaborative efforts continue to influence advancements in semiconductor manufacturing.