Kentaro Yamamura

Title: Kentaro Yamamura: Innovator in Substrate Processing Technology

Introduction

Kentaro Yamamura is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 6 patents. His innovative work focuses on improving the efficiency and effectiveness of substrate processing methods.

Latest Patents

Yamamura's latest patents include a substrate processing apparatus and a substrate processing method. The first patent describes a substrate processing apparatus designed to process a substrate measured by a film thickness measurement device. This apparatus features a heat treatment part that heat-treats a substrate coated with a coating film. Additionally, it includes a fluid supply part that supplies a fluid to suppress variations in film thickness over time until measurement occurs.

The second patent outlines a substrate processing apparatus that includes a thermal processor for thermal processing, an imager for imaging the substrate, and a controller for adjusting processing conditions. This adjustment processing involves imaging an unexposed adjustment substrate, performing thermal processing, and estimating the in-plane temperature distribution based on imaging results.

Career Highlights

Kentaro Yamamura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this company has allowed him to develop and refine his innovative ideas in substrate processing technology.

Collaborations

Yamamura has collaborated with notable coworkers, including Junji Nakamura and Kousuke Yoshihara. Their combined expertise has contributed to the advancement of substrate processing technologies.

Conclusion

Kentaro Yamamura is a key figure in the field of substrate processing, with a focus on enhancing processing methods through innovative technology. His contributions continue to impact the industry positively.