The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Sep. 06, 2021
Tokyo Electron Limited, Tokyo, JP;
Kentaro Yamamura, Koshi City, JP;
Shinichiro Kawakami, Koshi City, JP;
Toshiki Sagara, Koshi City, JP;
Eiichi Matsuoka, Koshi City, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A thermal treatment apparatus for thermally treating a substrate on which a coating film of a resist is formed and subjected to an exposure treatment, includes: a hot plate supporting and heating the substrate; a chamber housing the hot plate, the chamber having a ceiling forming thereunder a treatment space for performing the thermal treatment; a gas discharger discharging a treatment gas toward the substrate; a gas supplier supplying gas toward the substrate; a central exhauster exhausting the treatment space from a position close to a center of the substrate; a peripheral exhauster exhausting the treatment space from a side closer to a peripheral edge portion of the substrate; and a controller conducting a control to continue the discharge, supply of gas, and exhaust by the peripheral exhauster during the thermal treatment and enhance the exhaust by the central exhauster from a middle of the thermal treatment.