This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Toshiki Sagara: Thermal Treatment Technology
Introduction
Toshiki Sagara is an inventor associated with Koshi City, Japan, and Tokyo Electron Limited. His patent work concerns thermal processing equipment and methods for treating coated substrates after exposure.
Latest Patents
The available information lists one patent for Sagara: “Thermal Treatment Apparatus, Thermal Treatment Method, and Storage Medium.” The invention describes an apparatus that heats a resist-coated substrate on a hot plate inside a chamber. It uses gas delivery and separate central and peripheral exhaust systems. During thermal treatment, a controller maintains gas discharge, gas supply, and peripheral exhaust, while increasing central exhaust partway through the process. The design coordinates gas flow and exhaust around the substrate during heating.
Career Highlights
Sagara’s listed patent reflects work on thermal treatment processes used in semiconductor manufacturing. The record identifies Tokyo Electron Limited as the company with which he is associated. The supplied information credits him with 1 patent.
Collaborations
Eiichi Matsuoka and Kentaro Yamamura are identified as Sagara’s coworkers. Their names are provided as professional associations, without further details about specific joint projects.
Conclusion
Toshiki Sagara’s listed invention focuses on controlling gas flow and exhaust during substrate heating, illustrating his contribution to thermal treatment technology at Tokyo Electron Limited.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile