Tokyo, Japan

Fumio Kuriyama

This inventor holds 23 USPTO granted patents and 3 published patent applications, primarily in Plating Technologies. Top assignees: Ebara Corporation, Kabushiki Kaisha Toshiba, Toshiba Corporation. Active years: 1990-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumio Kuriyama. Retrieved from https://idiyas.com/inventor/fumio-kuriyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 78.3

Average Co-Inventor Count = 4.1

ph-index = 9

Forward Citations = 456(Granted Patents)


Location History:

  • Kanagawa, JP (1990 - 1991)
  • Yokohama, JP (1999 - 2005)
  • Tokyo, JP (2002 - 2016)

Company Filing History:


Years Active: 1990-2016

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Areas of Expertise:
Electroplating Method
Plating Apparatus
Substrate Plating
Magnetic Film
Anode Holder
Lead Free Bump
Film Deposition
Liquid Feed Vaporization
Turbomolecular Pump
Gas Injection Device
Electrolytic Plating
Evacuation Method
23 patents (USPTO):Explore Patents

Title: The Innovative Journey of Fumio Kuriyama

Introduction: Fumio Kuriyama, a distinguished inventor hailing from Tokyo, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Fumio Kuriyama's latest patents focus on advancements in artificial intelligence and renewable energy technologies, showcasing his commitment to creating a sustainable future.

Career Highlights: With a career spanning over two decades, Fumio Kuriyama has established himself as a pioneer in the field of robotics, with several of his inventions revolutionizing the way industries operate.

Collaborations: Throughout his career, Fumio Kuriyama has collaborated with leading research institutions and universities worldwide, fostering a culture of innovation and knowledge sharing.

Conclusion: Fumio Kuriyama's relentless pursuit of innovation and his passion for creating cutting-edge technologies continue to inspire the next generation of inventors and engineers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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