Daewon Yang

Title: Daewon Yang: Innovator in Semiconductor Technology

Introduction

Daewon Yang, based in Hopewell Junction, NY, is a notable inventor with an impressive portfolio of 20 patents. His contributions to semiconductor technology have advanced the efficiency and effectiveness of CMOS devices, marking him as a significant figure in the field of electrical engineering.

Latest Patents

Yang's latest innovations include two notable patents. The first patent focuses on "CMOS structures and methods for improving yield." This invention presents a simple and economical method to enhance the yield of CMOS devices through the use of contact etching stopper liners, including the single neutral stressed liner, single stressed liner, and dual stress liner (DSL). By employing a sputter etching process, the invention improves the smoothness and flattening of the top surface of the contact etch stopper liners, ultimately leading to significant yield increases in chip production.

The second patent pertains to a "Method and apparatus for angular high density plasma chemical vapor deposition." This innovation describes a process for forming a shallow trench capacitor in conjunction with a field-effect transistor (FET) by implanting various cell wells and forming a gate stack. This method not only increases efficiency but also addresses complexities in semiconductor structure design, further enhancing performance characteristics.

Career Highlights

Throughout his career, Daewon Yang has held significant positions at renowned companies such as International Business Machines Corporation (IBM) and Novellus Systems Incorporated. His work at these firms has enabled him to refine his innovative methodologies and contribute to the advancement of semiconductor technologies widely utilized in the industry today.

Collaborations

Yang has collaborated with notable colleagues including Richard Anthony Conti and Huilong Zhu. Their teamwork has fostered an environment of innovation, allowing for the exchange of ideas and furthering the development of cutting-edge technologies in the semiconductor sector.

Conclusion

In summary, Daewon Yang stands out as a pioneering inventor in semiconductor technology with a strong commitment to innovation evidenced by his 20 patents. His latest works continue to push the boundaries of what is possible in CMOS device manufacturing, reaffirming his influence and legacy in the industry.