Brian S Doyle

Cupertino, CA, United States of America

Brian S Doyle

Average Co-Inventor Count = 3.9

ph-index = 51

Forward Citations = 10,140(Granted Patents)

Forward Citations (Not Self Cited) = 9,198(Sep 21, 2024)

DiyaCoin DiyaCoin 20.97 

Inventors with similar research interests:


Location History:

  • Cupertinio, CA (US) (2000)
  • Cupertino, CA (US) (1998 - 2007)
  • Beaverton, OR (US) (2005 - 2009)
  • Beaverton, CA (US) (2008 - 2009)
  • New York, NY (US) (2016)
  • Porland, OR (US) (2022 - 2023)
  • Portland, OR (US) (2002 - 2024)


Years Active: 1998-2025

where 'Filed Patents' based on already Granted Patents

371 patents (USPTO):

Title: Brian Doyle: Pioneering Innovations in Semiconductor Technology

Introduction:

Brian Doyle, a prolific inventor and pioneer in semiconductor technology, is based in Portland, OR, in the United States. With an impressive portfolio of 315 patents, Doyle has made significant contributions to the field. This article explores some of his latest patents, career highlights, collaborations, and the immense impact he has had on the industry.

Latest Patents:

Doyle's recent patents showcase his expertise in pushing the boundaries of semiconductor device design. One of his notable inventions is the thin-film-transistor based CMOS circuit. This circuit utilizes a semiconductor substrate, bonding a first device of a first wafer with a second device at the back end of a second wafer. By employing an n-type oxide TFT and a p-type organic TFT, Doyle's innovation introduces a symmetrical pair of transistors that form the basis of this CMOS circuit.

Another groundbreaking patent by Doyle introduces ferroelectric field-effect transistors (FeFETs) with band-engineered interface layers. By combining a metal oxide material with a ferroelectric oxide material, Doyle's invention improves the performance and functionality of FeFET-based integrated circuits. This unique approach brings about enhanced reliability and efficiency, making it a significant advancement for the semiconductor industry.

Career Highlights:

Throughout his distinguished career, Doyle has made remarkable contributions to the field of semiconductor technology. Notably, he has worked with renowned companies such as Intel Corporation, where his groundbreaking inventions undoubtedly played a crucial role in shaping the company's future endeavors.

Collaborations:

Doyle's collaborations with esteemed colleagues have further strengthened his impact on the industry. He has had the privilege of working alongside notable professionals such as Robert S. Chau and Jack T. Kavalieros. These collaborations have fostered a dynamic exchange of ideas, leading to breakthrough innovations in semiconductor device design.

Conclusion:

Brian Doyle's extensive patent portfolio and impressive career in semiconductor technology make him a standout figure in the field. His latest patents demonstrate a deep understanding of semiconductor device design and reflect his commitment to pushing the boundaries of innovation. Doyle's collaborations with industry leaders have further advanced the field and paved the way for future developments. As a pioneer and visionary, Doyle's contributions continue to shape the semiconductor landscape, leaving an indelible mark on the industry as a whole.

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