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For the Inventor, By the Inventor

Biswajeet Guha

Hillsboro, OR, United States of America

Biswajeet Guha

LinkedIn
USPTO Granted Patents = 103 

 

Average Co-Inventor Count = 5.3

ph-index = 4

Forward Citations = 74(Granted Patents)

Forward Citations (Not Self Cited) = 51(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Ithaca, NY (US) (2013 - 2019)
  • Hillsboro, OR (US) (2021 - 2024)

Company Filing History:

goldMedal97 out of 54,688 
 
Intel Corporation
 patents
silverMedal3 out of 1,360 
 
Cornell University
 patents
bronzeMedal3 out of 278 
 
Kepler Computing Inc.
 patents

Years Active: 2013-2025

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Areas of Expertise:
Gate-All-Around Integrated Circuits
Nanowire Transistors
Epitaxial Structures
High Mobility Devices
Non-Planar Integrated Circuits
Dielectric Isolation Layers
Substrate-Less Structures
Cavity Spacers
Source/Drain Structures
Self-Aligned Gate Endcap (Sage)
Capacitor Fabrication
Dopant Diffusion Blocking Layers
103 patents (USPTO):Explore Patents
1. 12484272 - Source or drain structures with relatively high germanium content (2025-11-25),
2. 12484266 - Gate-all-around integrated circuit structures having underlying dopant-diffusion blocking layers (2025-11-25),
3. 12464815 - Fin cut in neighboring gate and source or drain regions for advanced integrated circuit structure fabrication (2025-11-04),
4. 12464730 - Method of forming capacitors through wafer bonding (2025-11-04),
5. 12453115 - Nanowire transistor structure and method of shaping (2025-10-21),
6. 12445134 - Diode connected non-linear input capacitors based majority gate (2025-10-14),
7. 12426316 - Method of fabricating integrated circuits with fin trim plug structures having an oxidation catalyst layer surrounded by a recessed dielectric material (2025-09-23),
8. 12419091 - Source electrode and drain electrode protection for nanowire transistors (2025-09-16),
9. 12412611 - Time decoupled write operations for non-linear polar material based memory (2025-09-09),
10. 12402349 - Gate-all-around integrated circuit structures having devices with channel-to-substrate electrical contact (2025-08-26),
11. 12382706 - Self-aligned gate endcap (SAGE) architectures with gate-all-around devices (2025-08-05),
12. 12369393 - Gate-all-around integrated circuit structures having depopulated channel structures using bottom-up approach (2025-07-22),
13. 12369392 - Fabrication of gate-all-around integrated circuit structures having pre-spacer deposition cut gates (2025-07-22),
14. 12364002 - Integrated circuit structures having metal gates with tapered plugs (2025-07-15),
15. 12349394 - Dielectric isolation layer between a nanowire transistor and a substrate (2025-07-01),

Title: Innovations and Patents of Biswajeet Guha

Introduction: Biswajeet Guha is an accomplished inventor based in Hillsboro, Oregon, with an impressive portfolio of 74 patents. His contributions to the field of integrated circuits have significantly advanced the technology, particularly in the domain of gate-all-around structures.

Latest Patents: Among Biswajeet Guha's latest patents are innovations related to integrated circuit structures with asymmetric source and drain contact structures. These patents detail methods of fabricating gate-all-around integrated circuit structures with a vertical arrangement of nanowires above a fin. This leads to improved performance in semiconductor devices. An additional patent focuses on integrated circuit structures featuring partitioned source or drain contact structures, which enhances the functionality and efficiency of circuit designs.

Career Highlights: Biswajeet Guha has made significant contributions while working at Intel Corporation. His innovative work in integrated circuit technology showcases his expertise and dedication to creating advanced electronic solutions.

Collaborations: Throughout his career, Biswajeet has collaborated with renowned colleagues such as Tahir Ghani and William Hsu. Their combined expertise has contributed to the successful development of cutting-edge technologies in the semiconductor industry.

Conclusion: With a wealth of patents and innovative achievements, Biswajeet Guha continues to be a prominent figure in the field of integrated circuits. His research and developments not only benefit his company but also contribute to the overall advancement of technology in the electronics sector.

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